Substrate and Microchip Edge Rounding
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Advanced Search Powered by KSearch 1.5b Substrate and Microchip Edge RoundingEdge Shaping and Beveling - Edge Grinding and PolishingA unique edging process could solve your microchip, window, and substrate corner rounding problems.
The degree of rounding is controllable to a few microns. This process is adaptable to most materials including Ceramics, Fused quartz-Silica, Glass, Silicon, Aluminum Nitride, hard metals, and various other hard and semi-hard materials. For more information, go to:
Return to Home Page: Dicing hybrid, semiconductor and dicing MEMS wafers Updated: 21 Jan 2009 |
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